Minimum cost Layout Decomposition and Legalization for Triple Patterning Lithography

With the need of 16/11nm cells, triple patterning lithography (TPL) has been concerned in lithography industry. Based on a new conflict projection technique to identify conflicts, we formulate in this paper the TPL layout decomposition problem as a minimum cost coloring problem. The problem is solved in two steps. First, it is relaxed to a … Read more